The history of thin film semiconductor manufacturing has been one of constant process improvement. This constant process improvement was necessary in order to establish cost effective, high yielding production lines as they struggled to keep pace with Moore’s law. All of this has been made possible through the integration of automated metrology systems with statistical process control. Today, automated metrology systems are implemented throughout the manufacturing process. Since many of the properties of a thin film are also temperature dependent, temperature stability is key and thermal management is critical. This paper reviews two major thermal management systems that are in use and the emerging trends for metrology systems and the implications for their associated thermal management systems.