Performing model based optical proximity correction (MB-OPC) is an essential step in the production of advanced integrated circuits that are manufactured with optical lithography technology. The accuracy of these models depends highly on the experimental data used in the model development process. The calibration features are weighted relative to each other depending on many aspects, this weighting plays an important role in the accuracy of the developed models.

In this paper, the effect of the feature weighting on OPC models is studied. Different weighting schemes are introduced and the effect on both the optical and resist models is presented and compared. The effect of the weighting on the overall model fitting was also investigated.

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