The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and mask

by Siemens EDA

Mentor Graphics Technical Library

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Siemens EDA

https://eda.sw.siemens.com/

Siemens EDA (formerly Mentor Graphics) is a leader in electronic design automation software, providing both software and hardware design solutions. We enable companies to develop better electronic products faster and more cost-effectively. Our innovative products and solutions help engineers conquer design challenges in the increasingly complex worlds of board and chip design.,... Read More

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The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and mask

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