Safe Interpolation Distance for VT5 Resist Model
Failure to provide sufficient IPS (i.e. mimic the design intent) coverage during model calibration could result in
marginalizing the VT5 model during OPC, but is difficult to judge when there is enough data volume to safely
interpolate and extrapolate design intent. In this paper, Mentor Graphics introduces a new metric called Safe Interpolation Distance (SID). This metric is a multi-dimensional metric which can be used to automatically detect the portions of the target design that are not covered well by the desired VT5 model.
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