Practical Guide: Comparing Process and Costs Benefits of DUV and i-line
Over the past 20 years there have been many technology developments that have extended Moore’s Law. In particular for the photolithography engineer, the technology nodes—i-line, DUV, 193nm, EUV—have had significant processing challenges trying to keep pace with shrinking geometries. This paper compares processing, equipment, materials, and costs between an i-line process and a DUV process.
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