Model-Based Retarget for 45nm Node and Beyond
To overcome the limitation of table-driven retargeting, we developed model-based retarget. If we set the criteria of process window, OPC tool resizes the layout dimension automatically. OPC tool will do retarget-OPC-retarget iterations until process windows of all of designs become within the criteria. Without complicated table-driven retarget, we can apply bias to original layout during OPC process automatically. We have found that model-based retarget enables simplification of OPC process. Apart from the stereotype bias rule, model-based retargeting can cope with more complicated layout, considering overall layout environment. Therefore, retargeting becomes more effective and adequate, avoiding over/under retargeting.
Please disable any pop-up blockers for proper viewing of this Whitepaper.