Model-Assisted Placement of Sub-resolution Assist Features Experimental Results

Lithography models calibrated from experimental data have been used to determine the optimum insertion strategy of sub-resolution assist features in a 130 nm process. This work presents results for 3 different illumination types: Standard, QUASAR, and Annular. The calibrated models are used to classify every edge in the design based on its optical properties (in this case image-log-slope). This classification is used to determine the likelihood of an edge to print on target with the maximum image-log-slope. In other words, the method classifies design edges not in geometrically equivalent classes, but according to equivalent optical responses. After all the edges are classified, a rule table is generated for every process. This table describes the width and separation of the assist features based on a global cost function for each illumination type. The tables are later used to insert the assist features of various widths and separations using pre-defined priority strategies.