Mask-friendly OPC for a Reduced Mask Cost and Writing Time
In this work, the reduction of the shot count of the mask data is studied. This shot count reduction is achieved by reducing of the number of jogs resulting from the Model-Based Optical Proximity Correction (MBOPC) stage. The results of this approach show a reduction of the total shot count in the mask fabrication stage by 18%, while the EPE distribution is still almost the same compared to the standard OPC approach, promising for a nice enhancement in the OPC flow to be more fracture friendly expected to decrease the data size of the fracturing, the mask writing time as well as the mask costs.
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