Integrated Circuit DFM Framework for Deep Subwavelength Processes
Until recently little has been done to formalize the concept of design for manufacturability (DFM) for integrated circuits. This is a complex problem that has been addressed from multiple angles with different degrees of success. While there can be certain operations which improve one manufacturability component, they can also adversely affect another. For this reason a framework that systematically addresses multiple manufacturability tradeoffs is required. This work proposes a pattern-centric DFM framework which emphasizes pattern robustness and introduces the concept of process variability bands (pv-Bands) to create a ranking system to measure the manufacturability of any design.
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