Implementing a Framework to Generate a Unified OPC Database from Different EDA Vendors for 45nm and Beyond
In this paper, we present a framework within which is demonstrated a systematic approach for matching any lithographical OPC solution from different Electronic Design Automation (EDA) vendors into Calibre. The goal is to export how the design will look on wafer from the foundry to the designers without saying how and without requiring installation of the same EDA tools.
In the developed framework, we will demonstrate the flow used to match all steps used in developing OPC, beginning with lithography modeling and going through to the OPC recipe. This is done by the use of automated scripts that characterize the existing OPC foundry solution and identify compatible counterparts in the Calibre to generate an encrypted package that can be used at the designers’ side.
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