Impact of Illumination on Model-Based SRAF Placement for Contact Patterning
Sub-Resolution Assist Features (SRAFs) have been used extensively to improve the process latitude for isolated and semi-isolated features in conjunction with off-axis illumination. This paper examines the impact of various illumination schemes on model-based SRAF placement, and compares the resulting process windows. Both standard illumination schemes and more elaborate pixel-based illumination pupil fills are considered.
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