Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process

by Siemens EDA

Mentor Graphics Technical Library

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Siemens EDA

https://eda.sw.siemens.com/

Siemens EDA (formerly Mentor Graphics) is a leader in electronic design automation software, providing both software and hardware design solutions. We enable companies to develop better electronic products faster and more cost-effectively. Our innovative products and solutions help engineers conquer design challenges in the increasingly complex worlds of board and chip design.,... Read More

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Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process

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