Contour-quality assessment for OPC model calibration
Site-based SEM measurements produce accurate OPC models in 180nm to 65nm technology nodes, but the lack of 2D information has prompted for new calibration methods for sub 65nm designs. A hybrid technique using site-based SEM measurements together with SEM contours has been developed to produce more accurate OPC models. Our results demonstrate a selection routine that consistently performs better than picking contours at random, and we discuss the trade-offs between coverage, accuracy and runtime with respect to model quality.
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