Compute resource management and TAT control in mask data preparation
With each new process technology node chip designs increase in complexity and size, and mask data prep flows require more compute resources to maintain the desired turn around time (TAT). This paper will explain the performance challenges in optimizing a mask data prep flow for TAT and cost while designing a compute resource system and its framework. In addition, the paper will analyze performance metrics TAT and throughput of a production system and discuss trade-offs of different parallelization approaches in data processing in interaction with dynamic resource control.
Please disable any pop-up blockers for proper viewing of this Whitepaper.