Automatic SRAF size optimization during OPC
This paper will explore the possibility of an alternate SRAF placement methodology where the SRAF placement rules can be greatly simplified, and SRAF printability through the required process window conditions will automatically be accounted for during a subsequent Optical Proximity Correction (OPC) step. This methodology has the advantages of simplifying the placement rules while simultaneously ensuring maximum possible SRAF size with no printing within the process window. The SRAF size optimization is performed concurrently with OPC thereby saving valuable time on trying to optimize the rule deck. In this method the side-lobes are automatically suppressed well under the imaging threshold. Experimental verification of the SRAF dependence on its sizing and placement along with printability and main-feature process window will be demonstrated.
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