Application of Mask Process Correction (MPC) to monitor and correct mask process drift

by Siemens EDA

Authored on: Jun 08, 2012

Mentor Graphics Technical Library

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Siemens EDA

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Siemens EDA (formerly Mentor Graphics) is a leader in electronic design automation software, providing both software and hardware design solutions. We enable companies to develop better electronic products faster and more cost-effectively. Our innovative products and solutions help engineers conquer design challenges in the increasingly complex worlds of board and chip design.,... Read More

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Application of Mask Process Correction (MPC) to monitor and correct mask process drift

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