A methodology to take LER effect into OPC modeling algorithm
This work is to weight different wafer data points with a weighting function. The weighting function is dependent on the LER value for each One-dimension feature in the sampling space of the modeling fitting. By this approach, we can filter wrong information of the process and make the OPC model more accurate. Further more, we will introduce this factor (LER) into variable threshold modeling parameters and see its differentiations between other Variable Threshold model forms.
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