As the technology advances, OPC run time turns to be a big concern and a great deal of our efforts is directed towards speeding up the LITHO operations. In addition, the OPC simulation consistency is sometimes deteriorated which is a critical issue especially for anchor features. On the other hand, full chip designs usually comprise large arrays of basic cells, used by OPC engineers to tune OPC recipes, which is evident for instance for memory design and processor chips. The model based OPC technique is not necessary for such designs provided that the equivalent mask shapes for one cell of these arrays are already known. This paper will introduce a combined approach using model and pattern based OPC.

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