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Understanding Electromigration and IR Drop in SoC Design

Authored on: Jul 16, 2018 by Rakesh Parmar, Prathmesh Oza, Neel Doshi

Technical Paper

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As we push through lower technology nodes in the IC and chip design, the wire width goes thinner along with transistor size. This makes the wire resistance more dominant on 16nm and below technology nodes. This increasing resistance and the decreasing width of metal wires introduce many Electromigration and IR drop issues. These two issues play major roles in reducing the lifespan of an electronic device and are the causes of functionality failure in any electronic devices with lower technology nodes. This paper discusses the problems of electromigration and IR drop, and techniques to prevent the occurrence of these issues in electronic devices.


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