|
Overview:
This tutorial goes into detail on the new technical challenges and solutions within both the business and historical context of the IC design and manufacturing process. It shows the importance of the fabless model as part of a more holistic DFM methodology, and includes demonstrations of what the new tools look like. In the nanometer age, sign-off must include not only fundamental, rule-based physical verification and parasitic extraction, but also a set of automated technologies that help improve yield by enhancing the design itself. View Today!
|
