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DESCRIPTION
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to begin the Lecture. |
The modeling of the plasma and
the automatic matching network can help in the optimization of the
matching network and etch process. This lecture
describes how to derive a mathematical and SPICE model and accounts
for the the power losses. This information allows the process
engineer to compensate for the power losses and perform "What If"
analysis.
Keywords: OSEE, online
symposium for electrical engineers
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