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Technical Papers |
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Implementing a Framework to Generate a Unified OPC Database from Different EDA Vendors for 45nm and Beyond
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Shady Abdel Wahed et al.
Mentor Graphics and United Microelectronics
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Apr 14, 2008
Mentor Graphics Technical Library |
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A Systematic Approach for Capturing Interconnects Hot Spots
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Te Hung Wu et al.
Mentor Graphics and United Microelectronics
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Mar 22, 2007
Mentor Graphics Technical Library |
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SEM Based Data Extraction for Model Calibration
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Mohamed Al-Imam et al.
Mentor Graphics and United Microelectronics
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Mar 21, 2007
Mentor Graphics Technical Library |
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Model Based OPC Considering Process Window Aspects—A Study
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Steffen Schulze, Pat LaCour, Emile Sahouria, Yuri Granik, and Nick Cobb, Oiseo Park, Rainer Zimmermann, Ming-Jui Chen
Infineon Technologies, United Microelectronics, and Mentor Graphics
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Mentor Graphics Technical Library |
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