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UBM Tech
UBM Tech

Addressing Challenges at 20nm: A Foundry and EDA Perspective

Original Air Date: Oct 24, 2011 | Duration: 45 min Webinar
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Synopsys and Samsung jointly present some key challenges of designing and manufacturing at 20nm. As foundry and design leader in the market, Samsung will present the foundry perspective of challenges seen at 20nm and Synopsys will focus on the 20nm challenges faced by designers and a solution that handles the effects of Double Patterning Technology (DPT) during physical design and verification.

Speakers:
Dr. Kuang-Kuo Lin, Ph.D.
Director, Foundry Design Enablement
Samsung America Headquarters (Device Solutions)

Kuang-Kuo “KK” Lin is a director of Foundry Design Enablement at Samsung America Headquarters (Device Solutions). Prior to joining Samsung, KK had held engineering and management positions at GlobalFoundries, Chartered, Intel, Cadence and HP. Dr. Lin has considerable experience in design and process development including DFM, tapeout flows, layout migration/compaction, custom layouts, full-chip integration/planning/place and route, and technology CAD (TCAD). He received his B.S., M.S. and Ph.D. degrees in electrical engineering and computer sciences from the University of California at Berkeley.

Dr. Tong Gao
Synopsys Fellow
Dr. Tong Gao is a Synopsys Fellow. Tong has been with Synopsys for more than seven years leading routing technologies and is the architect of IC Compiler Zroute. Before Synopsys, Tong was responsible for routing technologies in Monterey Design Systems, Avant!, and Silicon Graphics. He received his BS, MS, and Ph.D. degrees in Computer Science from University of Illinois at Urbana-Champaign.

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