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20nm Design--How this Advanced Technology Will Transform SoCs and EDA

Authored on: Jul 1, 2011

Technical Paper

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A number of manufacturing issues specific to 20nm pose a challenge to developing high-quality silicon and SoCs on time and on budget. Such an advanced node requires a holistic approach. This approach, coupled with new lithography techniques and in-design DFM technologies, provides the most practical and predictable path to 20nm silicon. Read this paper to learn more about the opportunities and challenges associated with 20nm design.

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